Memory device

ABSTRACT

A memory device is provided. The memory device comprises a substrate, first isolation structures, stacked device structures, and second isolation structures. The substrate comprises a memory cell area and a periphery area having trenches therein. Each stacked device structure is disposed between two neighboring trenches over the substrate. The stacked device structure comprises a gate dielectric layer and a gate layer. The gate dielectric layer covers part of the substrate. The second isolation structures are disposed between neighboring stacked device structures. The second isolation structure comprises a liner and an isolation layer. The liner is disposed on the sidewalls of the gate dielectric layer, the surface of the trenches, and the surface of the substrate not covered by the dielectric layer. The liner over the surface of the substrate not covered by the dielectric layer has a round curve. The isolation layer covers the liner, and fills the trenches.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the priority benefit of Taiwan applicationserial no. 93125312 filed Aug. 23, 2004.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor device, and moreparticularly, to a memory device.

2. Description of the Related Art

For various non-volatile memories, electrically erasable programmableread-only memories (EEPROMs) can read, write, program and erase memorycells for multiple times and still maintain the stored data even whenthe power is off. Accordingly, EEPROMs have been widely applied inapparatus such as personal computers and electronic devices.

EEPROM is a non-volatile memory which has advantages such as small cellsize, a high read/write speed and low power consumption. In addition,the data erasing in an EEPROM is performed by a block-by-block method.Therefore, EEPROM has a desired operational speed.

EEPROM comprises memory cells in the cell area and logic devices in theperipheral circuit. The memory cells and the logic devices are separatedby shallow trench isolation (STI) structures. Moreover, since theoperational voltages required for the memory cells and the logic devicesare different the gate dielectric layers for the memory cells and thelogic devices should be fabricated in separate processes.

FIGS. 1A-1C are cross sectional views showing a progression of aconventional method of fabricating EEPROM.

Referring to FIG. 1A, the substrate 100 is provided, which comprises thememory cell area 102 and the peripheral circuit area 104. The patternedtunneling layer 106, the floating gate 108 and the mask layer 110 areformed over the substrate 100. The mask layer 110 serves as a self-alignmask for etching the substrate 100 so as to form the trenches 112 in thesubstrate 100 of the memory cell area 102 and the trenches 114 in thesubstrate 100 of the peripheral circuit 104.

Referring to FIG. 1B, the liner 116 is formed on the surfaces of thetrenches 112 and 114, and sidewalls of the floating gate 108 and thetunneling layer 106. The isolation layer 118 is then filled in thetrenches 112 and 114. The mask layer 110 and a portion of the isolationlayer 118 are removed so as to form the isolation structure 120 in thememory cell area 102, and the isolation structure 122 in the peripheralcircuit area 104.

Referring to FIG. 1C, the inter-gate dielectric layer 124 is formed overthe surface of the floating gate 108 in the memory cell area 102. Then,the tunneling layer 106 and the floating gate 108 in the peripheralcircuit area 104 are removed. The removing can be performed, forexample, by a wet-etch process. Next, the gate dielectric layer 128 isformed over the substrate 100 in the peripheral circuit area 104. Thecontrol gate 130 is formed over the inter-gate dielectric layer 124 inthe memory cell area 102. The gate layer 132 is formed over the gatedielectric layer 128 in the peripheral circuit area 104.

In the conventional process, the device isolation area, i.e. the areafor the to-be-formed isolation structure, is defined by using theself-align mask so as to precisely control the critical dimension (CD)of the devices in the memory cell area 102. The logic devices in theperipheral circuit area 104, however, requires an operating voltagewhich is different from that of the memory cells in the memory cell area102. Accordingly, the formed tunneling layer 106 cannot serve as a gatedielectric layer 128 for the logic devices and so the gate dielectriclayer 128 should be formed in an additional process. Still, whileforming the gate dielectric layer 128, the floating gate 108 and thetunneling layer 106 are first removed in an isotropic wet-etch process.As a result, the neighboring isolation structure 122 can be damagedduring the etch process, forming an isolation structure with a humpshape 126 as shown. The isolation structure with the hump shape 126 willdeteriorate electrical isolation of the isolation structure 122 in theperipheral circuit area 104, which will result in leakage currents.Moreover, during the subsequent process of forming the gate layer 132,the gate material may be filled in the notches of the isolationstructure 122.

SUMMARY OF THE INVENTION

Accordingly, the present invention is directed to a memory device toresolve the damage issue on the trench isolation structures of theperipheral circuit area during the manufacturing process.

The present invention provides a memory device. The memory devicecomprises a substrate, at least one stacked structure of memory cell, aplurality of first isolation structures, at least one stacked devicestructure and a plurality of second isolation structures. The substratecomprises a memory cell area and a peripheral circuit area. The memorycell area comprises a plurality of first trenches. The peripheralcircuit area comprises a plurality of second trenches. Each stackedstructure of memory cell is disposed between two neighboring firsttrenches in the memory cell area over the substrate. The stackedstructure of memory cell comprises at least a tunneling layer, afloating gate, an inter-gate dielectric layer and a control gate layer.In addition, the first isolation structure is disposed between thestacked structures of memory cells in the memory cell area. The firstisolation structure comprises a first liner and a first isolation layer.Wherein, the first liner is disposed on sidewalls of the tunneling layerand the floating gate and on a surface of the first trench. Further, thefirst isolation layer covers the first liner, filling at least the firsttrench. Each stacked device structure is disposed between twoneighboring second trenches in the peripheral circuit area over thesubstrate. The stacked device structure comprises at least a gatedielectric layer and a gate layer, wherein the gate dielectric layercovers part of the substrate. In addition, the second isolationstructure is disposed between the stacked device structures in theperipheral circuit. The second isolation structure comprises a secondliner and a second isolation layer. Wherein, the second liner isdisposed on a sidewall of the gate dielectric layer, a surface of thesecond trench and part of a surface of the substrate not covered by thegate dielectric layer. The second liner disposed in areas not covered bythe gate dielectric layer has round curves. The second isolation layercovers the second liner, filling at least the second trench.

During the process of fabricating the stacked structure of memory cellin the memory cell area, a thick liner is formed on the surface of thetunneling layer not covered by the floating gate in the peripheralcircuit area. While removing the floating gate and tunneling layer inthe process of fabricating the stacked device structure in theperipheral circuit area, the thicker liner can prevent substantialdamage on the second isolation structure. Accordingly, the secondisolation structure is intact and maintains the desired electricalisolation performance. In other words, after removing the floating gateand the tunneling layer, the liner at the area not covered by the gatedielectric layer in the peripheral circuit area has a round curve.

The above and other features of the present invention will be betterunderstood from the following detailed description of the embodiments ofthe invention that is provided in communication with the accompanyingdrawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A-1C are cross sectional views showing a progression of aconventional method of fabricating an EEPROM.

FIGS. 2A-2D are cross sectional views showing a progression of a methodof fabricating a shallow trench isolation according to an embodiment ofthe present invention.

FIGS. 3A-3F are cross sectional views showing a progression of a methodof fabricating a memory device according to another embodiment of thepresent invention.

DESCRIPTION OF THE EMBODIMENTS

FIGS. 2A-2D are cross sectional views showing a progression of a methodof fabricating a shallow trench isolation according to an embodiment ofthe present invention.

Referring to FIG. 2A, a substrate 200 is provided, which comprises afirst device area 202 and a second device area 204. A protection layer206 and a patterned mask layer 208 are formed over the substrate 200.Wherein, the material of the protection layer 206 can be a dielectricmaterial, such as silicon oxide. The silicon oxide protection layer 206can be formed, for example, by thermal oxidation. In some embodiments,the mask layer 208 can be made of a conductive material, such aspolysilicon, doped polysilicon or other conductive materials. Inparticular, the conductive mask layer 208 formed in the first devicearea 202 can be preserved in subsequent process as a gate. In the otherembodiments, when the mask layer 208 is made of conductive material, anadditional mask layer (not shown) can be formed to cover the mask layer208. The additional mask layer can be made of silicon nitride.

Referring to FIG. 2B, by using the patterned mask layer 208 in the firstdevice area 202 as a self-align mask, the protection layer 206 and thesubstrate 200 are etched so as to form the trenches 210 in the substrate200 of the first device area 202. The etching method can be, forexample, an anisotropic etching process.

Spacers 212 are formed on the sidewalls of the mask layer 208 in thesecond device area 204. The spacers 212 can be made of oxide or nitride.In some embodiment, the spacers 212 are further formed on the sidewallsof the trenches 210 and the mask layer 208 in the first device area 202.The process of forming the spacers 212 may comprise, for example,forming a conformal isolation layer over the substrate 200, andperforming an anistoropic etching process on the conformal isolationlayer.

Referring to FIG. 2C, the mask layer 208 and the spacers 212 in thesecond device area 204 serve as a self-align mask for etching theprotection layer 206 and the substrate 200. The trenches 214 are thusformed in the substrate 200 of the second device area 204. In someembodiments, if high-voltage devices are to be formed in the seconddevice area 204, the trenches 214 should be deeper than the firsttrenches 210 in the first device area 202. With the deeper trenches 214,the isolation performance of the isolation structure is improved.Thereafter, the spacers 212 are then removed.

Referring to FIG. 2D, a liner 216 is formed on the sidewalls of theexposed mask layer 208, the surfaces of the trenches 210 and 214, andthe surface of the exposed protection layer 206 in the second devicearea 204. The liner 216 can be made of silicon oxide, which can beformed, for example, by thermal oxidation. In particular, if theprotection layer 206 is silicon oxide, the exposed protection layer 206in the second device area 204 will be oxidized. Accordingly, an area ofthe liner 216 indicated by 218 will form a round curve. In someembodiments, due to the rounding of the liner 216 over the exposedprotection layer 206, the liner 216 thereon is thicker than that on theother areas.

An isolation layer 220 is then filled in the trenches 210 and 214 so asto form the isolation structures 222 and 224.

With the method described above, the device isolation area, i.e. thearea for the to-be-formed isolation structure 222 in the subsequentprocess, in the first device area 202 can be defined by the self-alignmask. Accordingly, the critical dimension of the devices in the firstdevice area 202 can be precisely controlled. Moreover, in the seconddevice area 204, after the mask layer 208 and the protection layer 206are removed in the subsequent process, the thick liner 216 over thesurface of the exposed protection layer 206 protects the isolationstructure 224 from damages during the etching process.

The following is a method of fabricating a memory device as anapplication of the method of fabricating the shallow trench isolationdescribed above. The present invention, however, is not limited thereto.

FIGS. 3A-3F are cross sectional views showing a progression of a methodof fabricating a memory device according to another embodiment of thepresent invention.

Referring to FIG. 3A, a substrate 300 is provided, which comprises amemory cell area 302 and a peripheral circuit area 304. A tunnelinglayer 306 and the patterned floating gate 308 are formed over thesubstrate 300. Wherein, the tunneling layer 306 can be made of siliconoxide, which can be formed, for example, by thermal oxidation. In someembodiments, mask layers 310 and 312 are formed over the floating gate308. The mask layer 310 can be made of silicon nitride, which can beformed, for example, by chemical vapor deposition (CVD). In addition,the mask layer 312 can be made of borosilicate glass (BSG), which can beformed, for example, by CVD.

Referring to FIG. 3B, the floating gate 308 in the memory cell area 302serves as a self-align mask for etching the tunneling layer 306 and thesubstrate 300. Accordingly, the trenches 314 are formed in the substrate300 of the memory cell area 302. The etching method can be, for example,an anisotropic etching method. In this embodiment, the peripheralcircuit area 304 is covered by a photoresist layer (not shown), and isthus protected from the etching damage. In addition, the top corners ofthe mask layer 312 in the memory cell area 302 may also be damagedduring the etching process. Accordingly, the thickness of the topcorners of the mask layer 312 is reduced.

Next, spacers 316 are formed on the sidewalls of the floating gate 308in the peripheral circuit area 304. The spacers 316 can be made of oxideor nitride. In some embodiment, the spacers 316 are further formed onthe sidewalls of the mask layers 312 and 310, the floating gate 308 andthe trenches 314 in the memory cell area 302. Wherein, the process offorming the spacers 316 may comprise, for example, forming an isolationlayer over the substrate 300 and performing an anisotropic etchingprocess on the isolation layer.

Referring to FIG. 3C, the floating gate 308 and the spacers 316 in theperipheral circuit area 304 serve as a self-align mask for etching thetunneling layer 306 and the substrate 300. Accordingly, the trenches 318are formed in the substrate 300 of the peripheral circuit area 304. Inthis embodiment, the memory cell area 302 is covered by a photoresistlayer (not shown), and is thus protected from damages during the etchingprocess. In some embodiments, since the logic devices formed in thesecond device area 304 in the subsequent process are high-voltagedevices, the trenches 318 herein should be deeper than the firsttrenches 314 in the memory cell area 302. With the deeper trenches 318,the isolation performance of the isolation structure formed in theperipheral circuit area 304 is improved. Next, the spacers 316 and themask layer 312 are removed.

Referring to FIG. 3D, a liner 320 is formed on the sidewalls of theexposed floating gate 308, the surfaces of the trenches 314 and 318, andthe surface of the tunneling layer 306 exposed in the peripheral circuitarea 304. The liner 320 can be made of silicon oxide, which can beformed, for example, by thermal oxidation. If the tunneling layer 306 isalso made of silicon oxide, the exposed tunneling layer 306 in theperipheral circuit area 304 will be oxidized. Accordingly, the area ofthe liner 320 indicated by 322 will have a round curve. In someembodiments, due to the rounding of the liner 320 over the exposedtunneling layer 306, the liner 320 thereon is thicker than that on theother areas.

An isolation layer 324 is then filled in the trenches 314 and 318. Themask layer 310 and portions of the isolation layer 324 are removed so asto form the isolation structures 326 and 328. Wherein, the planarizationmethod can be, for example, chemical-mechanical polish (CMP) process.

Referring to FIG. 3E, an inter-gate dielectric layer 330 is formed overthe surface of the floating gate 308 in the memory cell area 302. Insome embodiments, before forming the inter-gate dielectric layer 330, anadditional floating gate 332 is formed over the floating gate 308 in thememory cell area 302 so as to increase the contact area of the floatinggates 308 and 332 and the gate dielectric layer 330. Accordingly, thegate coupling ratio (GCR) of the memory device is enhanced. In someembodiments, the floating gate 332 further covers a portion of theisolation structure 326.

Next, the floating gate 308 and the tunneling layer 306 in theperipheral circuit area 304 are removed. The process of removing thefloating gate 308 and the tunneling layer 306 can be, for example, anisotropic-etching process or a wet-etching process. Though a portion ofthe isolation layer 324 can be damaged during the etching process, thethicker liner 320 over the exposed tunneling layer 306 can protect theisolation structure 328 from etching damages. Accordingly, theconventional isolation structure with hump shape can be avoided andtherefore the electrical isolation of the isolation structure 328 isimproved. In addition, the memory cell area 302 is covered by thephotoresist layer (not shown), and is thus prevented from etchingdamage.

Referring to FIG. 3F, a gate dielectric layer 334 is formed over thesurface of the substrate 300 in the peripheral circuit area 304. Thegate dielectric layer 334 can be made of silicon oxide, which can beformed, for example, by thermal oxidation.

A control gate 336 is then formed over the gate dielectric layer 330 inthe memory cell area 302, and a gate layer 338 is formed over the gatedielectric layer 334 in the peripheral circuit area 304. The controlgate 336 and the gate layer 338 can be made of polysilicon, dopedpolysilicon or other conductive materials. The process of forming thecontrol gate 336 and the gate layer 338 comprises, for example, forminga conductive layer over the substrate 300, and defining the conductivelayer by photolithographic and etching processes. In some embodiments, aportion of the gate layer 338 is formed over the isolation structure328.

The following is a structure obtained according to the fabricationmethod of the memory device described above. Referring to FIG. 3F, thememory device comprises the substrate 300, at least one stackedstructure of memory cell 301, a plurality of the isolation structures326, at least one stacked device structure 303 and a plurality ofisolation structures 328.

The substrate 300 comprises the memory cell area 302 and the peripheralcircuit area 304. The memory cell area 302 comprises a plurality oftrenches 314, and the peripheral circuit area 304 comprises a pluralityof trenches 318. In some embodiments, the trenches 318 are deeper thanthe trenches 314. Accordingly, the isolation structures 328 have betterisolation performance.

Each stacked structure of memory cell 301 is disposed between twoneighboring trenches 314 over the substrate 300. The stacked structureof memory cell 301 comprises at least the tunneling layer 306, thefloating gate 308, the inter-gate dielectric layer 330 and the controlgate 336. In some embodiments, an additional floating gate 332 isdisposed between the floating gate 308 and the inter-gate dielectriclayer 330 so as to increase the contact area of the floating gates 308and 332 and the inter-gate dielectric layer 330. Accordingly, the gatecoupling ratio (GCR) of the memory device is thus enhanced. In someembodiments, the floating gate 332 further covers a portion of theisolation structure 326.

Each isolation structure 326 is disposed between two neighboring stackedstructures of memory cells 301 in the memory cell area 302. Theisolation structure 326 comprises the liner 320 and the isolation layer324. The liner 320 is disposed on the sidewalls of the tunneling layer306 and the floating gate 308 and the surfaces of the trenches 314. Inaddition, the isolation layer 324 covers the liner 320 and at leastfills the trenches 314.

Each stacked device structure 303 is disposed between two neighboringtrenches 318 over the substrate 300 in the peripheral circuit area 304.The stacked device structure 303 comprises at least the gate dielectriclayer 334 and the gate 338. The gate dielectric layer 334 covers part ofthe substrate 300. In some embodiments, the gate layer 338 covers partof the isolation structures 328.

Each isolation structure 328 is disposed between two neighboring stackeddevice structures 303 in the peripheral circuit area 304. The isolationstructure 328 comprises the liner 320 and the isolation layer 324. Theliner 320 is disposed on the sidewalls of the gate dielectric layer 334,the surfaces of the trenches 318 and the surface of the substrate 300not covered by the gate dielectric layer 334. On the other hand, theisolation layer 324 covers the liner 320 and at least fills the trenches318. In particular, the liner 320 has round curves on the surface of thesubstrate 300 not covered by the gate dielectric layer 334, and isthicker than liner 320 on the other areas.

In the process of fabricating the stacked structure of memory cell inthe memory cell area, the thick liner is formed on the surface of thetunneling layer not covered by the floating gate in the peripheralcircuit area. In the subsequent process when the floating gate and thetunneling layer are removed in the peripheral circuit area, theisolation structures can be protected from etching damage. Accordingly,the isolation performance of the isolation structure is thus improved.In other words, after removing the floating gate and the tunneling layerin the peripheral circuit area, the liner not covered by the gatedielectric layer will have a round curve.

Accordingly, the present invention has at least the followingadvantages:

1. For the memory cell area or the first device area according to thepresent invention, the device isolation area, i.e. the area for theto-be-formed isolation structure in the subsequent process, can bedefined with the self-align mask. Accordingly, the critical dimension ofthe devices in the first device area or the memory cell area can beprecisely controlled.

2. In the second device area or the peripheral circuit area, afterremoving, the tunneling layer and the floating gate or the mask layerand the protection layer in the subsequent process, the thick linerformed over the surface of the exposed tunneling layer or the exposedprotection layer protects the isolation structure from etching damageg.Accordingly, the isolation performance of the isolation structure isthus enhanced.

3. For the memory cell area, the isolation structure is prevented frometching damage in the present invention. Therefore, unlike theperipheral circuit area, the memory cell area does not require spacersas part of the etch mask. Accordingly, the density in the memory cellarea is not sacrificed. Further, the present invention also prevents theisolation structure from etching damage in the periphery circuit area.In other words, the present invention meets the requirement of differentdevice areas and performs suitable process.

Although the present invention has been described in terms of exemplaryembodiments, it is not limited thereto. Rather, the appended claimsshould be constructed broadly to include other variants and embodimentsof the invention which may be made by those skilled in the field of thisart without departing from the scope and range of equivalents of theinvention.

1. A memory device, comprising: a substrate, comprising a memory cellarea and a peripheral circuit area, the memory cell area comprising aplurality of first trenches, the peripheral circuit area comprising aplurality of second trenches; at least one stacked structure of memorycell disposed between two neighboring first trenches in the memory cellarea over the substrate, the stack structure of memory cell comprisingat least a tunneling layer, a floating gate, a inter-gate dielectriclayer and a control gate; a plurality of first isolation structuresdisposed between the neighboring stacked structures of memory cells inthe memory cell area, the first isolation structure comprising: a firstliner disposed on sidewalls of the tunneling layer and the floating gateand a surface of the first trench; and a first isolation layer coveringthe first liner, at least filling the first trenches; at least onestacked device structure disposed between two neighboring secondtrenches in the peripheral circuit area over the substrate, the stackeddevice structure comprising at least a gate dielectric layer and a gatelayer, wherein the gate dielectric layer covers part of the substrate;and a plurality of second isolation structures disposed betweenneighboring stacked device structures in the peripheral circuit, thesecond isolation structure comprising: a second liner disposed on asidewall of the gate dielectric layer, a surface of the second trenchesand a surface of the substrate not covered by the gate dielectric layer,the second liner having a round curve at an area not covered by the gatedielectric layer; and a second isolation layer covering the secondliner, at least filling the second trenches.
 2. The memory device ofclaim 1, wherein the second liner layer at the area not covered by thegate dielectric layer is thicker than that in the other areas.
 3. Thememory device of claim 1, wherein the second trench is deeper than thefirst trench.
 4. The memory device of claim 1, further comprising anadditional floating gate disposed between the floating gate and theinter-gate dielectric layer.